Electron Beam Lithography Write Time Calculator

EOS Mode:
Beam Current [nA]:
Dose [μC/cm2]:
Pattern Area [mm2]:
Stage moves:
Shot Pitch/Step:
Time [hh:mm:ss]:

This calculator estimates the write time by evaluating this equation:
     t = d*A/I + 0.5*s,
where t is time in [s], A is the pattern area in [mm2], d is the dose in [uC/cm2], I is the beam current in [nA], and s is the number of stage moves for the entire exposure. The minimum possible write time for a exposure is approximated by assuming that the stage move is 0. A more accurate approximation requires inputting the number of stage moves used for the entire exposure. The minimum amount of time for a stage move is approximately 0.5 seconds. Even with the number of stage moves known, this calculator will underestimate the actual write time because it does not take into account the time spent calibrating between jobs and the actual stage move time depends on distance.